EUV scanner installed
Imec has started the installation of ASML's pre-production extreme ultraviolet lithography (EUVL) scanner, the NXE:3100, in its Leuven facility. The installation of the NXE:3100 features a considerably higher source power and optimised optics.
With the installation the research program moves to the preproduction stage, shifting the focus from mainly an infrastructure study to include now also a manufacturability study. The NXE:3100 at imec uses a DPP (discharge produced plasma) EUV light source from Extreme Technologies (Ushio).
At comparable process conditions the NXE:3100 has recently demonstrated a throughput performance increase of a factor of 20 over the EUV alpha demo tool at imec. This increase is based on increased power, higher transmission and dual stages.
The research program will tackle scanner-specific issues correlated to the difference between EUV lithography and optical lithography through the integration of 14 nm logic and 2 and 1 x nm memory processes. Research will also focus on resists that allow to optimally exploit the resolution of EUV by tackling line-edge roughness and pattern collapse and on reticle defectivity.
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