Faster FeRAM on the way

Wednesday, 03 September, 2003

Epson is developing a ferroelectric material for ferroelectric random-access memory (FeRAM), a next generation type of memory. The new material has been tentatively named PZTN.

To create the material, Epson has added niobium in place of some of the titanium in lead zirconate titanate (PZT), a candidate for use in FeRAM material. Using an original technique, the company has been able to introduce niobium in 20 to 30 times the quantity that was previously practically possible.

As a result, Epson has been able to overcome the oxygen deficit that had caused problems with FeRAM.

The company is now proceeding with technical testing of the FeRAM-based electronic devices using the PZTN material. Potential applications may include IC cards, mobile phones and as a semiconductor memory substitute.

Related News

New multimodal transistor for brighter display tech

A new type of electronic component developed by researchers at the University of Surrey could...

Novel design for flexible thermoelectric semiconductor

Researchers have identified a new material which could be used as a flexible semiconductor in...

A lighter, smarter magnetoreceptive electronic skin

Researchers have developed an innovative e-skin that facilitates a new level of interaction...


  • All content Copyright © 2025 Westwick-Farrow Pty Ltd