Photonic crystal stamp
A high-accuracy, low-cost photonic stamp in silicon is aimed at helping the growing demand for photonic crystal structures necessary for future photonic devices.
Photonic crystals will comprise the building blocks for next-generation photonic devices. The photonic stamp from Danish company NIL Technology is an attempt to contribute to these further developments within devices based on active optical components and integrated optics as high brightness LEDs and solid-state lighting, besides eg, bio-medical applications employing photonic crystal structures.
The stamp features pillar arrays with structure sizes from 125 to 275 nm and pitches ranging from 200–500 nm in silicon. It has a very large imprinting area of 4 cm2, making it suitable for pre-production. Based on a novel fabrication technique using electron beam lithography, the stamps also have anti-sticking coating and dicing optional extras.
Red OLED microdisplay for energy-efficient AR/VR
Researchers have developed a CMOS-based red OLED microdisplay with luminance and improved power...
Next-gen semiconductor material for light-based electronics
Scientists from the University of Edinburgh have created a new type of material that could enable...
Chip-scale optical amplifier enhances data and sensing
Energy-efficient and small enough to fit in a smartphone, an optical amplifier developed at...
