Thin film lens array
Depositing silicon dioxide (SiO2) over a square-patterned substrate could turn out to be an attractive route to making arrays of micro and nanosized lenses.
"There's no need for substrate etching and [the process] results in a high fill factor," said researchers.
Rather than conforming to the shape of the individual squares, the deposited SiO2 layer adopts an almost spherical profile that is suitable for optical applications.
The scientists from the University of Illinois at Chicago, US, used e-beam lithography to pattern their sample, but point out that nano-imprint technologies could also be used to prepare the substrate.
Fully coupled annealing processor for enhanced problem solving
Researchers have designed a scalable, fully-coupled annealing processor with 4096 spins, and...
STMicroelectronics breaks 20 nm barrier for next-gen microcontrollers
STMicroelectronics has launched an advanced process based on 18 nm Fully Depleted Silicon On...
Chip opens door to AI computing at light speed
A team of engineers have developed a silicon-photonics chip that uses light waves, rather than...